Dates of event: October 20-21, 2017 Registration deadline: October 13, 2017 URL with relevant information: http://rechgroup.pt/rech4.html
The 4th International Meeting on Retouching of Cultural Heritage (RECH4) will take place in Split, Croatia, from October 20th to October 21th, 2017. The program includes 24 papers and 16 posters. The authors will cover a wide range of topics, from digital options for documentation, diagnosis and treatment, to new solutions and materials for filling and retouching of losses. The event is organized by the Escola Artistica e Profissional Arvore (Portugal), the Faculty of Fine Arts of the University of Lisbon (Portugal), the Arts Academy of the University in Split (Croatia), the Catholic University of Portugal, Cinabrio (Portugal) and the University of Aveiro (Portugal). With over 150 attendees, RECH meetings have become one of the largest educational and scientific events in the field, an ideal venue for conservators and scientists, practitioners and theoreticians, to present the results of their research on retouching. The meetings focus on the ideas, concepts, terminology, methods, techniques and materials applied during the retouching process in different areas of conservation: mural painting, easel painting, sculpture, graphic documentation, architecture, plasterwork, photography, contemporary etc. Registration for the 4th International Meeting on Retouching of Cultural Heritage (RECH4) is open until October 13, 2017. There are two types of registration: Regular (25€) and Student (15€). Please fill out the online form to register: https://docs.google.com/forms/d/e/1FAIpQLSfScBFVy1CjYkeafTOiJ5qB3rcvyK_EcyhYaFZWXsAY1EKDkw/viewform We look forward to seeing you in Split! - - - Sagita Mirjam Sunara, PhD, Assistant Professor Head of the Conservation-Restoration Department Arts Academy of the University of Split Fausta Vrančića 17a, 21000 SPLIT - CROATIA ****** Unsubscribe by sending a message to [email protected] Searchable archives: http://cool.conservation-us.org/byform/mailing-lists/cdl/
